SAN JOSE — KLA-Tencor Corp. today announced the addition of an etch modeling and analysis module to its Prolith lithography simulation and modeling software to help users accelerate advanced ...
LEUVEN, Belgium — This week, at SPIE 2023 Advanced Lithography + Patterning Conference, in San Jose, CA, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, ...
Several fab tool vendors are rolling out the next wave of self-aligned patterning technologies amid the shift toward new devices at 10/7nm and beyond. Applied Materials, Lam Research and TEL are ...
SAN JOSE, Calif. — For next-generation memory production, 193-nm lithography with self-aligned double-patterning (SADP) are the technology of choices over rival schemes, according to an analyst.
SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of ...
Belgian research lab Imec has revealed advances single-print high numerical aperture EUV lithography at the ‘SPIE Photomask Technology + EUV Lithography’ conference in Monterey California: Line ...
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