AMSTERDAM, Dec 21 (Reuters) - Dutch semiconductor equipment maker ASML ASML.AS said on Thursday it is shipping the first of its new "High NA" extreme ultraviolet lithography systems to Intel INTC.O ...

B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.

Intel’s comeback in cutting edge manufacturing is no longer a vague roadmap, it now revolves around a single, spectacular ...

ASML and Intel have reached the "First Light" milestone using ASML's latest High-NA lithography system, turning on its light source and making the light reach resist on the wafer. The report is coming ...

The Netherlands-based semiconductor equipment maker ASML (NASDAQ:ASML) achieved "first light" on its new High NA EUV lithography system, Reuters reported. The milestone means that the tool is ...

The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual ...

An investigation reveals how far China's own chip manufacturing has progressed. The technology of world market leader ASML ...

Steven Scheer: "The opening of the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands, marked a milestone in preparing High NA EUV for adoption in mass manufacturing [1].

Intel has been in the news lately for being the first semiconductor fab to jump aboard the high numerical aperture (high-NA) fabrication train. The company is the first of the big fabs to buy a ...

In the third quarter of 2025, ASML's top-line growth nearly flatlined as a 6% year-over-year decline in its new system ...