The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...

Rising lithography costs, shrinking feature sizes, and the need for an alternative to copper are collectively spurring new interest in area-selective deposition. An extension of atomic layer ...

Moore’s law has driven the semiconductor industry to continue downscaling the critical size of transistors to improve device density. At the beginning of this century, traditional scaling started to ...

Chemical Vapor Deposition (CVD) is a widely used technique in materials science, particularly in the fabrication of thin films and coatings, as well as the synthesis of advanced materials. It involves ...